Project: An International Standard for Reliable Chemical Depth Profiling of Organic Materials

Being able to measure the distribution of chemical components in the near-surface region of materials is essential to understanding and optimising their performance and manufacture. Sputter depth profiling offers this capability and is routinely used for the quantitative analysis of semiconductor materials and inorganic thin films in advanced manufacturing. However, while several international standards exist to support such analyses, these cannot be extended to organic (carbon-based) materials, which offer a low-cost, flexible alternative to conventional materials. EMRP project NEW01 TReND established the metrology needed to underpin sputter depth profiling of organic materials and this project will develop a documentary standard that enables industry to measure the average sputtering yield volume - a key parameter in the sputter depth profiling of organic materials. Such a standard has been identified as a high priority by primary supporter ISO/TC 201, and by ensuring consistent results across different instruments and techniques, it will support academia and industry to develop innovative, low-cost electronic devices based on organic materials.

Acronym	15SIP02 ISOChemDepth (Reference Number: 15SIP02)
Duration	01/05/2016 - 01/05/2019
Project Topic	Metrology
Project Results (after finalisation)	See Website
Website	visit project website
Network	EMPIR
Call	EMPIR CALL 2015

Project partner

Number	Name	Role	Country
1	NPL Management Limited	Coordinator	United Kingdom