Project: Metrology of small structures for the manufacturing of electronic and optical devices
The reliable measurement of small structures, less than one micrometre in size, is necessary to develop optical and semiconductor technologies that are dependent on the miniaturisation of components. Scatterometry is a tool that measures by scattering light across a surface and detecting the reflections. It is relatively fast compared with traditional techniques such as Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM), and could be more widely used during manufacturing processes were it not for a lack of universal standards. This project will provide a scatterometry reference standard, also suitable for testing AFM and SEM devices that will add traceability to scatterometric measurements and make them comparable to microscopic methods.
Acronym | IND17 Scatterometry (Reference Number: IND17) |
Duration | 01/10/2011 - 30/09/2014 |
Project Topic | Metrology |
Project Results (after finalisation) |
See Website |
Website | visit project website |
Network | EMRP |
Call | EMRP Call 2010 - Industry and Environment |
Project partner
Number | Name | Role | Country |
---|---|---|---|
1 | Physikalisch-Technische Bundesanstalt | Coordinator | Germany |
2 | Cesky Metrologicky Institut | Partner | Czech Republic |
3 | Dansk Fundamental Metrologi A/S | Partner | Denmark |
4 | Teknologian tutkimuskeskus VTT Oy | Partner | Finland |
5 | NPL Management Limited | Partner | United Kingdom |
6 | VSL B.V. | Partner | Netherlands |
7 | Nanocomp Oy Ltd | Observer | Finland |
8 | JCMwave GmbH | Germany | |
9 | Itä-Suomen yliopisto | Finland |