Project: Metrology for airborne molecular contamination in manufacturing environments
The ability to operate at smaller scales brings with it technical progress but also a need for tighter control of manufacturing environments. Airborne molecular contamination in the form of vapours or aerosols can have adverse effects on small scale products, processes or instruments and this can lead to the corrosion of metal surfaces or the formation of contamination layers. This is a particular problem in the semiconductor, nanotechnology, photovoltaic and LED industries. These industries demand continuous measurement and control of airborne molecules to optimise production processes, particularly when taking new techniques to smaller scales. The main sources of contamination are the chemicals used during manufacturing such as acids, bases, dopants and metals, some of which require detection at the parts per billion level. This project will use state-of-the-art techniques for practical airborne molecular contamination monitoring to develop portable ultra-sensitive monitoring equipment for use in manufacturing environments. It will also develop new material generation methods to help reliably calibrate industrial equipment.
Acronym | IND63 MetAMC (Reference Number: IND63) |
Duration | 01/05/2013 - 30/04/2016 |
Project Topic | Metrology |
Project Results (after finalisation) |
See Website |
Website | visit project website |
Network | EMRP |
Call | EMRP Call 2012 - Industry, SI Broader Scope and Open Excellence |
Project partner
Number | Name | Role | Country |
---|---|---|---|
1 | Teknologian tutkimuskeskus VTT Oy | Coordinator | Finland |
2 | Cesky Metrologicky Institut | Partner | Czech Republic |
3 | Istituto Nazionale di Ricerca Metrologica | Partner | Italy |
4 | NPL Management Limited | Partner | United Kingdom |
5 | Physikalisch-Technische Bundesanstalt | Partner | Germany |
6 | VSL B.V. | Partner | Netherlands |
7 | HC Photonics Corporation Limited | Observer | Taiwan |
8 | Politecnico di Torino | Italy |