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Deposition and sticking of matter in the sub-monolayer range during plasma surface functionalization processes

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Deposition and sticking of matter in the sub-monolayer range during plasma surface functionalization processes
University of Helsinki

Full name	University of Helsinki
Short name
Type of organisation	Higfer education
Partner Role	Partner
Country	Finland

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Funded by the European Union under the Grant Agreement no. 101102316. Views and opinions expressed are those of the author(s) only and do not necessarily reflect those of the European Union or the European Commission. Neither the European Union nor the granting authority can be held responsible for them.

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